Fabrication of nanoimprint stamps with structures down to 20-30nm. Holes, pillars, lines and grooves are standard patterns that we supply. For further information review technical limitations
Direct E-beam writing
E-beam lithography with feature sizes down to 20-30nm depending on pattern density.
Photomasks
Fabrication of high resolution photomasks with E-beam lithography.
Related services
Coatings (sputtering, evaporation)
Bonding
Etching
Dicing
Send your request to info@litcon.net